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Parametric study of methane dissociation and deposition rates in a Ar/CH4 RF plasma

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Engineering Sciences [physics] Plasmas Physics [physics] Physics [physics] Plasma Physics [physics.plasm-ph]

Maxime Mikikian  : Connect in order to contact the contributor

https://hal-univ-orleans.archives-ouvertes.fr/hal-03431563

Submitted on : Tuesday, November 16, 2021-5:31:32 PM

Last modification on : Thursday, December 2, 2021-5:42:03 PM

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hal-03431563 , version 1 (16-11-2021)

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  • HAL Id : hal-03431563 , version 1

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Erik von Wahl, Ianis Ellien, Thomas Lecas, Maxime Mikikian. Parametric study of methane dissociation and deposition rates in a Ar/CH4 RF plasma. Journées 2021 du GDR EMILI, Oct 2021, Palaiseau, France. ⟨hal-03431563⟩

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