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Parametric study of methane dissociation and deposition rates in a Ar/CH4 RF plasma

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hal-03431563 , version 1 (16-11-2021)

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  • HAL Id : hal-03431563 , version 1

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Erik von Wahl, Ianis Ellien, Thomas Lecas, Maxime Mikikian. Parametric study of methane dissociation and deposition rates in a Ar/CH4 RF plasma. Journées 2021 du GDR EMILI, Oct 2021, Palaiseau, France. ⟨hal-03431563⟩
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