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Poster communications

Parametric study of methane dissociation and deposition rates in a Ar/CH4 RF plasma

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https://hal-univ-orleans.archives-ouvertes.fr/hal-03431563
Contributor : Maxime Mikikian Connect in order to contact the contributor
Submitted on : Tuesday, November 16, 2021 - 5:31:32 PM
Last modification on : Wednesday, November 17, 2021 - 4:01:21 AM

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  • HAL Id : hal-03431563, version 1

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Erik von Wahl, Ianis Ellien, Thomas Lecas, Maxime Mikikian. Parametric study of methane dissociation and deposition rates in a Ar/CH4 RF plasma. Journées 2021 du GDR EMILI, Oct 2021, Palaiseau, France. ⟨hal-03431563⟩

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