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Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films

Abstract : Titanium-based thin films are synthesized by the magnetron sputtering of a titanium target in pure argon or in a mixture of argon and oxygen (reactive regime) in three experimental configurations: a hot target configuration for which the target is thermally disconnected from the cooled magnetron body, a cold/conventional target configuration, and a cold target configuration with an additional infrared source introduced in the chamber to understand the role of the radiation on thin film properties. In hot configuration, the target temperature and its emissivity are measured and compared to a 0D steady state model taking into account the main different cooling mechanisms. IR radiations constitute the major part of the total energy deposited on the substrate during hot target magnetron sputtering, whereas an increase of target temperature allows a rise of sputtered Ti and Ti + species fluxes and slightly affect their kinetic energy. In reactive regime, the obtained films are constituted of polycrystalline anatase TiO2, and an increase of target/IR source temperature leads to an improvement of crystallinity. In pure argon, hot configuration seems to enhance its porosity, induces columns exhibiting sharp-features, slightly modifies its crystalline properties and helps to decrease internal compressive stress.
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https://hal.archives-ouvertes.fr/hal-03034225
Contributeur : Anne-Lise Thomann <>
Soumis le : jeudi 10 décembre 2020 - 10:23:41
Dernière modification le : jeudi 17 décembre 2020 - 09:29:43
Archivage à long terme le : : jeudi 11 mars 2021 - 18:55:33

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Robin Graillot-Vuillecot, Anne-Lise Thomann, Thomas Lecas, Christophe Cachoncinlle, Eric Millon, et al.. Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films. Vacuum, Elsevier, 2020, 181, pp.109734. ⟨10.1016/j.vacuum.2020.109734⟩. ⟨hal-03034225⟩

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